Problem summary
When working on object with multiple UV patches, and attempting to create a mask out of a number of those patches Mari now takes a severely long time to generate this mask in comparisson to 2.6
Customer reported version
3.1v1
Steps to reproduce
1) Launch Mari 3.1v1
2) First load the archive found at \netshare\support\4Borna\10417\UDIM_Masking_31v1.mra
3) In the channel Test16BitLIN select the tiled layer
4) Set selection mode to 'Patch' and select more than one patch
5) Now on the Layer Right click and go to Mask>Layer Mask>Make Mask From Selected
For 2.6
1) Launch Mari 2.6v5
2) Load the archive found at \netshare\support\4Borna\10417\UDIM_Masking_26v5.mra
3) Select the tiled layer
4) Right click on the layer and go to Layer Mask>Add Mask>Hide All
5) Then set selection mode to 'Patch' and select more than one patch
6) Go to Patches>Fill White
Reproduced by support
Reproduced in 3.0v1 & 3.1v1 Win 7
Expected behaviour
In Mari 2.6v5 Creating this mask setup takes only 12-18 seconds, this was the expected behaviour
Actual behaviour
In Mari 3.1v1 Creating a mask from multiple patches takes 32-41 seconds which feels incredibly slow